DocumentCode
2740022
Title
Tuning the Polarity of Si-Nanowire Transistors Without the Use of Doping
Author
Weber, Walter M. ; Geelhaar, Lutz ; Lamagna, Luca ; Fanciulli, Marco ; Kreupl, Franz ; Unger, Eugen ; Riechert, Henning ; Scarpa, Giuseppe ; Lugli, Paolo
Author_Institution
Namlab gGmbH & Qimonda Dresden GmbH & Co. OHG, Dresden
fYear
2008
fDate
18-21 Aug. 2008
Firstpage
580
Lastpage
581
Abstract
In this article, a novel method of creating p- and n-type Si-NWs FETs by employing undoped NWs as the active region, is presented. This method does not require doping, but takes advantage of the inherent NW geometry and simply relies on the electrostatic control of the bands near the source- and drain- (S/D) contacts.
Keywords
Schottky gate field effect transistors; elemental semiconductors; nanoelectronics; nanowires; semiconductor quantum wires; silicon; FET; Schottky contacts; Si; Si-undoped nanowire transistor; electrostatic control; geometry; polarity; source-drain contact; Charge carrier processes; Dielectric measurements; Doping; Electrostatics; Energy measurement; FETs; Logic; Nanoelectronics; Schottky barriers; Technological innovation;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2008. NANO '08. 8th IEEE Conference on
Conference_Location
Arlington, TX
Print_ISBN
978-1-4244-2103-9
Electronic_ISBN
978-1-4244-2104-6
Type
conf
DOI
10.1109/NANO.2008.171
Filename
4617153
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