Title :
Solution Processed Large Area Surface Textures Based on Dip Coating
Author :
Wang, Yuehui ; Yang, Hongjun ; Chen, Li ; Zhou, Weidong ; Tao, Meng ; Guo, Qing
Author_Institution :
Dept. of Electr. Eng., Univ. of Texas at Arlington, Arlington, TX
Abstract :
We report here the dip coating processes for the formation of large area self-assembled monolayer of micro- sized silica spheres, on glass and on silicon substrates. The self- assembled structure and its spatial extent of monolayer were significantly influenced by the concentration of the suspension and the type of solvent, dip coating withdrawal speed, sample immersion time, relative humidity and substrate types. Record large areas of uniformly coated structures were formed with dimensions of 3times10 mm2 and 1.5times11 mm2 on the silicon and glass substrates, respectively. The rapid self-assembled monolayer with silica microspheres provided a glimpse at the wide range of coating and photonic device applications where dip coating can be used.
Keywords :
antireflection coatings; dip coating; glass; humidity; monolayers; self-assembly; silicon; silicon compounds; surface texture; suspensions; Si; SiO2; antireflection coatings; dip coating processes; glass substrate; microsized silica spheres; photonic device applications; relative humidity; sample immersion time; self-assembled monolayer; self-assembled structure; silica microspheres; silicon substrates; solution processed large area surface textures; suspension; Dip coating; Glass; Magnetic levitation; Optical films; Optical microscopy; Scanning electron microscopy; Self-assembly; Silicon compounds; Substrates; Surface texture;
Conference_Titel :
Nanotechnology, 2008. NANO '08. 8th IEEE Conference on
Conference_Location :
Arlington, TX
Print_ISBN :
978-1-4244-2103-9
Electronic_ISBN :
978-1-4244-2104-6
DOI :
10.1109/NANO.2008.230
