DocumentCode :
2741199
Title :
Structural and optical properties of very high quality GaAs/AlGaAs multiple quantum well structures grown on (111)A substrates by MOVPE
Author :
Sanz-Hervas, A. ; Cho, Soohaeng ; Kovalenkov, O.V. ; Dickey, S.A. ; Majerfeld, A. ; Villar, C. ; Lopez, M. ; Melliti, R. ; Wang, G. ; Tronc, P. ; Kim, B.W.
Author_Institution :
Dept. of Electr. & Comput. Eng., Colorado Univ., Boulder, CO, USA
fYear :
1997
fDate :
8-11 Sep 1997
Firstpage :
291
Lastpage :
294
Abstract :
We report an investigation of the structural and optical properties of the first high quality GaAs/AlGaAs multi-quantum-well structures grown on (111)A substrates by the metallorganic vapor phase epitaxial process at the relatively low temperature of 600°C. By high-resolution X-ray diffractometry it is shown that the structure analyzed has a good crystal quality and period reproducibility. The structural and optical properties were also investigated by photoluminescence and photoreflectance spectroscopies. A photoluminescence linewidth of 12.3 meV at 11 K indicates that the well length (105 Å) fluctuation over 10 periods is at most ±3 monolayers. A detailed analysis of the photoreflectance spectrum at 11 K permits an excellent identification of all the allowed and also weakly allowed optical transitions expected for this structure, further demonstrating that the heterointerfaces are abrupt and smooth
Keywords :
III-V semiconductors; MOCVD; X-ray diffraction; aluminium compounds; gallium arsenide; interface structure; photoluminescence; photoreflectance; semiconductor growth; semiconductor quantum wells; semiconductor superlattices; spectral line breadth; vapour phase epitaxial growth; (111)A substrates; 11 K; 600 C; GaAs-AlGaAs; MOVPE; crystal quality; heterointerfaces; high quality GaAs/AlGaAs multiple quantum well structures; high-resolution X-ray diffractometry; metallorganic vapor phase epitaxial process; optical properties; period reproducibility; photoluminescence; photoluminescence linewidth; photoreflectance; photoreflectance spectrum; structural properties; structure; weakly allowed optical transitions; well length fluctuation; Epitaxial growth; Epitaxial layers; Gallium arsenide; Molecular beam epitaxial growth; Optical device fabrication; Optical devices; Photoluminescence; Quantum well devices; Substrates; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductors, 1997 IEEE International Symposium on
Conference_Location :
San Diego, CA
Print_ISBN :
0-7503-0556-8
Type :
conf
DOI :
10.1109/ISCS.1998.711638
Filename :
711638
Link To Document :
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