• DocumentCode
    2741228
  • Title

    Formation of Ni/NiO Nanoparticles in Supermicroporous Silica-Based SiO2-Al2O3-NiO Materials: Structural and Magnetic Studies

  • Author

    Bakhmutov, Vladimir I. ; Shpeizer, Boris G. ; Prosvirin, Andrey V. ; Dunbar, Kim R. ; Clearfield, Abraham

  • Author_Institution
    Dept. of Chem., Texas A&M Univ., College Station, TX
  • fYear
    2008
  • fDate
    18-21 Aug. 2008
  • Firstpage
    791
  • Lastpage
    792
  • Abstract
    Microporous silica-based materials SiO2-Al2O3-NiO with a predominant pore size in the range 8-20 Aring, prepared by the sol-gel method by variation in Ni2+ concentrations from 0 to 30 weight %, have been characterized by X-ray diffraction, X-ray photoelectron spectroscopy. The nature of the nickel centers has been studied by magnetic susceptibility measurements supported by the XPS and X-ray experiments. It has been shown that these centers represent NiO and Ni0 (observed at high nickel loadings) aggregated into nanoparticles. The Ni0 nanoparticles are responsible for the room-temperature ferromagnetic behavior of the materials prepared with high nickel loadings.
  • Keywords
    X-ray diffraction; X-ray photoelectron spectra; aggregates (materials); alumina; magnetic particles; magnetic susceptibility; nanoparticles; nanotechnology; nickel; nickel compounds; porosity; porous materials; silicon compounds; sol-gel processing; Ni; SiO2-Al2O3-NiO; X-ray diffraction; X-ray experiments; X-ray photoelectron spectroscopy; XPS; aggregation; ferromagnetic properties; magnetic susceptibility; nanoparticles; pore size; sol-gel method; supermicroporous silica-based materials; Aluminum; Amorphous magnetic materials; Antiferromagnetic materials; Crystalline materials; Inorganic materials; Magnetic materials; Magnetic susceptibility; Nanoparticles; Nickel; X-ray diffraction;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2008. NANO '08. 8th IEEE Conference on
  • Conference_Location
    Arlington, TX
  • Print_ISBN
    978-1-4244-2103-9
  • Electronic_ISBN
    978-1-4244-2104-6
  • Type

    conf

  • DOI
    10.1109/NANO.2008.236
  • Filename
    4617218