Title :
The thickness effect of SiOx layer in CIGS thin-film solar cells fabricated on stainless-steel substrate
Author :
Chung, Y.D. ; Cho, D.H. ; Han, W.S. ; Park, N.M. ; Lee, K.S. ; Oh, S.Y. ; Kim, J.
Author_Institution :
Electron. & Telecommun. Res. Inst., Daejeon, South Korea
Abstract :
We have investigated the thickness effect of SiOx layer in the CIGS thin-film solar cells fabricated on stainless-steel substrate. After a SiOx layer with a thickness of 1 or 2-μm was deposited on the substrate by using plasma-enhanced chemical vapor deposition, Na-doped Mo layer and Mo layer were coated on it. A CIGS thin-film solar cell on the stainless-steel substrate without the SiOx layer showed an efficiency of 7.47 %, the solar cell with the 1 μm-thick SiOx showed an efficiency of 11.82 %, and the solar with the 2 μm-thick SiOx showed the efficiency of 12.43%. The efficiency of CIGS solar cell with 2 μm-thick SiOx was higher than those of others with the thinner SiOx barrier.
Keywords :
plasma CVD; silicon compounds; solar cells; stainless steel; substrates; CIGS thin-film solar cells; SiO; plasma-enhanced chemical vapor deposition; stainless-steel substrate; thickness effect; Dielectrics; Fabrication; Photovoltaic cells; Photovoltaic systems; Substrates; Zinc oxide;
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4244-5890-5
DOI :
10.1109/PVSC.2010.5614680