DocumentCode :
2742936
Title :
Progress of SANYO´s R&D on thin film silicon solar module
Author :
Sekimoto, Takeyuki ; Katayama, Hirotaka ; Murata, Kazuya ; Matsumoto, Mitsuhiro ; Kitahara, Akinao ; Hishida, Mitsuoki ; Aya, Youichirou ; Shinohara, Wataru ; Nakagawa, Makoto ; Terakawa, Akira ; Tanaka, Makoto
Author_Institution :
Adv. Photovoltaics Dev. Center, SANYO Electr. Co., Ltd., Gifu, Japan
fYear :
2010
fDate :
20-25 June 2010
Abstract :
We have been developing original technologies for Localized Plasma Confinement (LPC) CVD method. LPC-CVD method achieves both a high deposition rate and a high conversion efficiency. From the results of IR analysis and Raman spectroscopy for μc-Si i-layer thin films, it was suggested that the combination of high stretching mode fractions in IR spectra and Raman crystallinity may have a correlation with the conversion efficiency of a-Si/μc-Si tandem cells. An R&D line for processing a-Si/μc-Si solar modules on G5.5 size glass substrates (1100 × 1400 mm2) has been constructed. Module efficiency of 11.1% (Initial) and 10.0% (Stable) has been achieved with a film deposition rate for the μc-Si i-layer of 2.4 nm/s on a G5.5 size substrate.
Keywords :
Raman spectroscopy; amorphous semiconductors; elemental semiconductors; infrared spectra; nanostructured materials; plasma CVD; plasma confinement; research and development; semiconductor thin films; silicon; solar cells; μc-Si i-layer thin film; IR spectra; LPC-CVD method; R&D; Raman spectroscopy; Sanyo; Si; a-Si; glass substrate; localized plasma confinement CVD method; mode fraction; tandem cell; thin film silicon solar module; Europe; Films; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
Conference_Location :
Honolulu, HI
ISSN :
0160-8371
Print_ISBN :
978-1-4244-5890-5
Type :
conf
DOI :
10.1109/PVSC.2010.5614744
Filename :
5614744
Link To Document :
بازگشت