Title :
Design and fabrication of antireflection structured surface
Author :
Sixiang Chen ; Xinjian Yi ; Sihai Chen ; Zuhai Chen
Author_Institution :
State Key Lab. of Laser Technol., Huazhong Univ. of Sci. & Technol., Wuhan, China
Abstract :
A symmetric two-dimensional (2D) periodic structure for antireflection coating applications is investigated in detail, based on the effective medium theory. The surface-relief patterns are designed and fabricated on silicon wafers, using binary optical processing methods. The structured surfaces with symmetric patterns as single homogeneous antireflective coatings. The significant improvement of transmittance with structured surfaces is observed at 10.6 /spl mu/m long-wavelength infrared region.
Keywords :
antireflection coatings; electron beam lithography; etching; optical fabrication; periodic structures; refractive index; silicon; 10.6 micron; ARC fabrication; Si; Si wafers; antireflection coating applications; antireflection structured surface; binary optical processing methods; effective medium theory; long-wavelength IR region; single homogeneous antireflective coatings; surface-relief patterns; symmetric 2D periodic structure; transmittance; two-dimensional periodic structure; Coatings; Equations; Optical crosstalk; Optical design; Optical device fabrication; Optical films; Optical polarization; Optical surface waves; Silicon; Strips;
Conference_Titel :
Infrared and Millimeter Waves, 2000. Conference Digest. 2000 25th International Conference on
Conference_Location :
Beijing, China
Print_ISBN :
0-7803-6513-5
DOI :
10.1109/ICIMW.2000.892972
