Title :
An electrical test structure to evaluate substrate compatibility with wafer cleaning
Author :
Peyne, C.M. ; Fallon, M. ; Stevenson, J.T.M. ; Walton, AJ
Author_Institution :
EKC Technol. Ltd., East Kilbride, UK
Abstract :
Every new wet chemical clean process requires evaluation to assess its compatibility with the wafer substrates. A novel application of the standard Greek cross used in conjunction with an electrical linewidth test structure allows vertical and lateral etch rates to be determined. A new test structure is presented to allow in situ real-time measurements to be made
Keywords :
electric resistance measurement; etching; integrated circuit technology; substrates; surface cleaning; Greek cross; electrical linewidth test structure; etch rate; real-time measurement; wafer substrate compatibility; wet chemical cleaning; Chemical industry; Chemical processes; Chemical technology; Cleaning; Electric resistance; Electrical resistance measurement; Etching; Performance evaluation; Substrates; Testing;
Conference_Titel :
Microelectronic Test Structures, 1996. ICMTS 1996. Proceedings. 1996 IEEE International Conference on
Conference_Location :
Trento
Print_ISBN :
0-7803-2783-7
DOI :
10.1109/ICMTS.1996.535882
