Title :
Novel fabrication methods of gratings for DFB lasers using ECR-CVD SiNx films
Author :
Sugimoto, Hiroshi ; Abe, Yuji ; Ohtsuka, Ken-ichi ; Ohishi, Toshiyuki ; Matsui, Teruhito ; Ogata, Hitoshi
Author_Institution :
Central Res. Lab., Mitsubishi Electr. Corp., Hyogo, Japan
Abstract :
Quarter-wave-shifted gratings and short period gratings were fabricated by novel methods using electron cyclotron resonance plasma assisted chemical vapour deposition (ECR-CVD) SiNx films. SiN x films deposited on photoresist have a higher etching rate than those deposited on a flat substrate. The authors made good use of this difference to fabricate these gratings and 1.55 μm quarter-wave-shifted DFB lasers
Keywords :
diffraction gratings; distributed feedback lasers; laser accessories; optical films; optical workshop techniques; plasma CVD coatings; semiconductor junction lasers; silicon compounds; 1.55 micron; DFB lasers; ECR-CVD SiNx films quarter wave shifted gratings; SiNx; electron cyclotron resonance plasma assisted chemical vapour deposition; etching rate; fabrication methods; gratings; photoresist; short period gratings;
Conference_Titel :
Optical Communication, 1988. (ECOC 88). Fourteenth European Conference on (Conf. Publ. No.292)
Conference_Location :
Brighton
