DocumentCode :
2745642
Title :
Silicon Oxynitride Formation In Nitrous Oxide (N/sub 2/O): The Role Of Nitric Oxide (NO)
Author :
Tobin, P.J. ; Okada, Y. ; Lahkotia, V. ; Ajuria, S.A. ; Feil, W.A. ; Hegde, R.L.
Author_Institution :
Motorola
fYear :
1993
fDate :
17-19 May 1993
Firstpage :
51
Lastpage :
52
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1993. Digest of Technical Papers. 1993 Symposium on
Conference_Location :
Kyoto, Japan
Type :
conf
DOI :
10.1109/VLSIT.1993.760240
Filename :
760240
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2745642
