• DocumentCode
    2746165
  • Title

    Fatigue strength of electroplated copper thin films under uni-axial stress

  • Author

    Murata, Naokazu ; Tamakawa, Kinji ; Suzuki, Ken ; Miura, Hideo

  • Author_Institution
    Grad. Sch. of Eng., Tohoku Univ., Sendai
  • fYear
    2008
  • fDate
    22-24 Oct. 2008
  • Firstpage
    41
  • Lastpage
    44
  • Abstract
    Fatigue strength of electroplated copper thin films was measured under uni-axial stress. Two kinds of electroplated films were prepared for the fatigue test. One was a commercial film mainly used for interconnections in printed wiring boards. The other film was grown on a stainless steel substrate by using acid copper sulfate bath without any additive agent. The micro texture of each film was observed by using SEM (Scanning Electro Microscope) and SIM (Scanning Ion Microscope). It was found that the micro texture of each film was quite different with each other. The mechanical properties such as the yield stress, fracture elongation and Young´s modulus of each film changed significantly from those of bulk copper depending on their micro structure. The low-cycle fatigue strength also varied drastically with each other, while the high-cycle fatigue strength was almost same. The fracture surfaces were observed by SEM after the fatigue test. It was found that there were two fracture modes under the fatigue test. One was a typical ductile fracture, and another was brittle one even under the fatigue load higher than its yield stress. The crack seemed to propagate through the grains when the ductile fracture occurred. On the other, the crack seemed to propagate along grain boundaries of columnar grains when the brittle fracture occurred. These results clearly indicated that the fatigue strength of electroplated copper thin films varies depending on their micro structure.
  • Keywords
    brittle fracture; copper; cracks; ductile fracture; electroplated coatings; fatigue; grain boundaries; internal stresses; ion microscopy; metallic thin films; scanning electron microscopy; yield stress; SEM; SIM; Young´s modulus; brittle fracture; columnar grains; crack; ductile fracture; electroplated copper thin films; fatigue strength; fracture elongation; fracture surfaces; grain boundaries; interconnections; printed wiring boards; scanning electro microscope; scanning ion microscope; uni-axial stress; yield stress; Additives; Copper; Fatigue; Scanning electron microscopy; Steel; Stress measurement; Substrates; Testing; Transistors; Wiring;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Materials and Packaging, 2008. EMAP 2008. International Conference on
  • Conference_Location
    Taipei
  • Print_ISBN
    978-1-4244-3620-0
  • Electronic_ISBN
    978-1-4244-3621-7
  • Type

    conf

  • DOI
    10.1109/EMAP.2008.4784224
  • Filename
    4784224