مرکز منطقه ای اطلاع رساني علوم و فناوري - Strategy For Gate-Oxide Yield Improvement On CZ And EPI Wafers

DocumentCode :

2746190

Title :

Strategy For Gate-Oxide Yield Improvement On CZ And EPI Wafers

Author :

Mertens, P.W. ; Schmidt, H.F. ; Meuris, M. ; Verhaverbeke, S. ; Graef, D. ; Dillenbeck, K. ; Salem, S.S. ; Heyns, M.M.

Author_Institution :

IMEC

fYear :

1993

fDate :

17-19 May 1993

Firstpage :

111

Lastpage :

112

fLanguage :

English

Publisher :

ieee

Conference_Titel :

VLSI Technology, 1993. Digest of Technical Papers. 1993 Symposium on

Conference_Location :

Kyoto, Japan

Type :

conf

DOI :

10.1109/VLSIT.1993.760270

Filename :

760270

Link To Document :