A Superior TiN/TiSi/sub 2/ Barrier Layer By Using Sputter Deposition From A TiN/sub 0.4/ Alloy Target And Subsequent RTN

Author

Nakamura, H. ; Fushimi, K. ; Sakaya, Y. ; Ajioka, T. ; Hiraki, A. ; Kubota, K.

Author_Institution

Oki Electric Industry Co.,Ltd.

fYear

1993

fDate

17-19 May 1993

Firstpage

127

Lastpage

128

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1993. Digest of Technical Papers. 1993 Symposium on

Conference_Location

Kyoto, Japan

Type

DOI

10.1109/VLSIT.1993.760281

Filename

760281

Link To Document