مرکز منطقه ای اطلاع رساني علوم و فناوري - Molecular-scale Models For Simulation Of Nanometer Lithography With Application To A Negative Chemical Amplification Resist

DocumentCode :

2746582

Title :

Molecular-scale Models For Simulation Of Nanometer Lithography With Application To A Negative Chemical Amplification Resist

Author :

Scheckler, E.W. ; Ogawa, T. ; Yoshimura, T. ; Shukuri, S. ; Takeda, E.

Author_Institution :

Hitachi Ltd.,

fYear :

1993

fDate :

17-19 May 1993

Firstpage :

149

Lastpage :

150

fLanguage :

English

Publisher :

ieee

Conference_Titel :

VLSI Technology, 1993. Digest of Technical Papers. 1993 Symposium on

Conference_Location :

Kyoto, Japan

Type :

conf

DOI :

10.1109/VLSIT.1993.760292

Filename :

760292

Link To Document :