• DocumentCode
    2746582
  • Title

    Molecular-scale Models For Simulation Of Nanometer Lithography With Application To A Negative Chemical Amplification Resist

  • Author

    Scheckler, E.W. ; Ogawa, T. ; Yoshimura, T. ; Shukuri, S. ; Takeda, E.

  • Author_Institution
    Hitachi Ltd.,
  • fYear
    1993
  • fDate
    17-19 May 1993
  • Firstpage
    149
  • Lastpage
    150
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1993. Digest of Technical Papers. 1993 Symposium on
  • Conference_Location
    Kyoto, Japan
  • Type

    conf

  • DOI
    10.1109/VLSIT.1993.760292
  • Filename
    760292
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2746582