DocumentCode
2747249
Title
Sweeping quartz crystals
Author
Gualtieri, John G.
Author_Institution
US Army Electron. Technol. & Devices Lab., Fort Monmouth, NJ, USA
fYear
1989
fDate
3-6 Oct 1989
Firstpage
381
Abstract
Sweeping is a purification process that removes certain impurities and thereby improves the radiation sensitivity of quartz crystals. The major steps of a typical sweeping process consist of applying electrodes to the Z -surfaces of a lumbered quartz bar; applying voltage to the electrodes to produce an electric field of approximately 1 kV/cm; heating the bar slowly either in air, vacuum, or hydrogen-containing or inert atmospheres to about 500°C; monitoring the current through the bar; and, when the current decays to some near-constant value, cooling the bar slowly to room temperature and removing the voltage. Alkali-metal impurities, such as Li+ and Na+, are charge compensators for trivalent aluminium impurities in quartz. When sweeping is performed in air or H2 the alkalis diffuse to the cathode and are replaced by the indiffusion of hydrogen at the anode. The alkali-metal impurities are subsequently removed by lapping the Z -surfaces. The sweeping process also modifies dislocations, reducing the tendency for formation of etch channels. Recent advances have involved the use of impurity characterizations such as electron spin resonance, acoustic loss measurements, and infrared absorption spectroscopy
Keywords
acoustic variables measurement; quartz; 500 degC; H-containing atmosphere; H2; Li+; Na+; Z-surfaces; acoustic loss measurements; air; alkali-metal impurities; current; dislocations; electron spin resonance; etch channels; heating; inert atmospheres; infrared absorption spectroscopy; lumbered quartz bar; purification process; quartz crystals; radiation sensitivity; sweeping process; vacuum; Atmosphere; Cooling; Crystals; Electrodes; Impurities; Infrared spectra; Monitoring; Purification; Resistance heating; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultrasonics Symposium, 1989. Proceedings., IEEE 1989
Conference_Location
Montreal, Que.
Type
conf
DOI
10.1109/ULTSYM.1989.67014
Filename
67014
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