DocumentCode
274761
Title
Advanced materials techniques for large HgCdTe focal plane arrays
Author
Tennant, W.E. ; Kozlowski, L.J. ; Bubulac, L.O. ; Gertner, E.R. ; Vural, K.
Author_Institution
Rockwell International Sci. Center, Dallas, TX, USA
fYear
1990
fDate
5-7 Jun 1990
Firstpage
15
Lastpage
19
Abstract
The advent of advanced materials techniques (MOCVD and MBE) for growing HgCdTe on alternative substrates has opened new avenues for IR system development. 128×128 and 256×256 SWIR staring arrays of HgCdTe grown on sapphire substrates offer highly sensitive viewing of distant astronomical objects. Similar sized HgCdTe/sapphire MWIR arrays at 77 K have shown in-lab noise equivalent temperature differences <0.02 K and excellent operability and uniformity. LWIR diodes formed by ion-implantation in HgCdTe on either GaAs or Si substrates show performance comparable at 77 K to devices made in HgCdTe grown on more common II-VI substrates. This suggests that substrate producibility limits. The authors discuss the following topics: basic alternative-substrate HgCdTe materials and device architectures for SWIR, MWIR, and LWIR; description of SWIR and MWIR imaging arrays; LWIR results; and implications for future IR FPAs
Keywords
II-VI semiconductors; III-V semiconductors; cadmium compounds; elemental semiconductors; gallium arsenide; image sensors; infrared detectors; mercury compounds; semiconductor technology; silicon; substrates; 128 pixel; 16384 pixel; 256 pixel; 65536 pixel; 77 K; GaAs; HgCdTe-GaAs; HgCdTe-Si; IR system; LWIR diodes; MBE; MOCVD; MWIR arrays; SWIR staring arrays; Si; focal plane arrays; ion-implantation; sapphire substrates;
fLanguage
English
Publisher
iet
Conference_Titel
Advanced Infrared Detectors and Systems, 1990., Fourth International Conference on
Conference_Location
London
Print_ISBN
0-86341-702-7
Type
conf
Filename
98648
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