• DocumentCode
    274761
  • Title

    Advanced materials techniques for large HgCdTe focal plane arrays

  • Author

    Tennant, W.E. ; Kozlowski, L.J. ; Bubulac, L.O. ; Gertner, E.R. ; Vural, K.

  • Author_Institution
    Rockwell International Sci. Center, Dallas, TX, USA
  • fYear
    1990
  • fDate
    5-7 Jun 1990
  • Firstpage
    15
  • Lastpage
    19
  • Abstract
    The advent of advanced materials techniques (MOCVD and MBE) for growing HgCdTe on alternative substrates has opened new avenues for IR system development. 128×128 and 256×256 SWIR staring arrays of HgCdTe grown on sapphire substrates offer highly sensitive viewing of distant astronomical objects. Similar sized HgCdTe/sapphire MWIR arrays at 77 K have shown in-lab noise equivalent temperature differences <0.02 K and excellent operability and uniformity. LWIR diodes formed by ion-implantation in HgCdTe on either GaAs or Si substrates show performance comparable at 77 K to devices made in HgCdTe grown on more common II-VI substrates. This suggests that substrate producibility limits. The authors discuss the following topics: basic alternative-substrate HgCdTe materials and device architectures for SWIR, MWIR, and LWIR; description of SWIR and MWIR imaging arrays; LWIR results; and implications for future IR FPAs
  • Keywords
    II-VI semiconductors; III-V semiconductors; cadmium compounds; elemental semiconductors; gallium arsenide; image sensors; infrared detectors; mercury compounds; semiconductor technology; silicon; substrates; 128 pixel; 16384 pixel; 256 pixel; 65536 pixel; 77 K; GaAs; HgCdTe-GaAs; HgCdTe-Si; IR system; LWIR diodes; MBE; MOCVD; MWIR arrays; SWIR staring arrays; Si; focal plane arrays; ion-implantation; sapphire substrates;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Advanced Infrared Detectors and Systems, 1990., Fourth International Conference on
  • Conference_Location
    London
  • Print_ISBN
    0-86341-702-7
  • Type

    conf

  • Filename
    98648