Title :
Ultrahigh-Q nanocavities fabricated by scanning probe microscope lithography on pre-patterned photonic crystal
Author :
Yokoo, Atsushi ; Tanabe, Takasumi ; Kuramochi, Eiichi ; Notomi, Masaya
Abstract :
The details of cavity formation mechanism are described in this paper. The pre-patterned structure is a line defect waveguide in a two-dimensional (2D) photonic crystal slab, and we assume that the refractive index is modulated in the yellow shaded region. A very small spatial index modulation (Δn/n <; 0.1%) changes the mode-gap edge frequency of the modified area to create barrier regions, while the unmodified area retains its original mode-gap edge frequency. As a result, an ultrahigh-Q cavity with a small volume can be created.
Keywords :
nanolithography; nanophotonics; optical fabrication; optical modulation; optical waveguides; photonic crystals; refractive index; scanning probe microscopy; line defect waveguide; mode-gap edge frequency; pre-patterned structure; refractive index; scanning probe microscope lithography; spatial index modulation; two-dimensional photonic crystal slab; ultrahigh-Q nanocavity fabrication; Cavity resonators; Fabrication; Hafnium; Optical waveguides; Photonic crystals; Q factor; Wet etching;
Conference_Titel :
Photonics Conference (PHO), 2011 IEEE
Conference_Location :
Arlington, VA
Print_ISBN :
978-1-4244-8940-4
DOI :
10.1109/PHO.2011.6110558
