DocumentCode :
2748872
Title :
Bilateral comparison of 10 kΩ resistance standards between KRISS and the BIPM
Author :
Kim, Wan-Seop ; Yu, Kwang Min ; Kim, Mun-Seog ; Park, Po Gyu ; Kim, Kyu-Tae
Author_Institution :
Center for Electr., Korea Res. Inst. of Stand. & Sci., Daejeon, South Korea
fYear :
2012
fDate :
1-6 July 2012
Firstpage :
384
Lastpage :
385
Abstract :
This paper reports the results of an ongoing bilateral key comparison at 10 kΩ resistance standards between KRISS and the BIPM. Two 10 kΩ travelling resistance standards of the BIPM were measured at KRISS against a 100 Ω transfer standard by using a homemade cryogenic current comparator (CCC) bridge system. The value of the transfer standard resistor maintained at KRISS is calibrated against the quantized Hall resistance at plateau i = 2 using the same CCC. The measurement result shows that the equivalence of about -1 × 10-9 in the resistance calibrations between the two institutions is much smaller than the measurement uncertainty of 32 × 10-9(k=2).
Keywords :
Hall effect; electric resistance measurement; measurement standards; measurement uncertainty; BIPM; KRISS; bilateral comparison; cryogenic current comparator bridge system; measurement uncertainty; quantized Hall resistance; resistance 10 kohm; resistance standards; Current measurement; Electrical resistance measurement; Resistance; Resistors; Standards; Temperature measurement; Uncertainty; cryogenic current comparator; key comparison; measurement uncertainty; quantized Hall resistance; resistance standards;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Precision Electromagnetic Measurements (CPEM), 2012 Conference on
Conference_Location :
Washington, DC
ISSN :
0589-1485
Print_ISBN :
978-1-4673-0439-9
Type :
conf
DOI :
10.1109/CPEM.2012.6250964
Filename :
6250964
Link To Document :
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