DocumentCode
2748872
Title
Bilateral comparison of 10 kΩ resistance standards between KRISS and the BIPM
Author
Kim, Wan-Seop ; Yu, Kwang Min ; Kim, Mun-Seog ; Park, Po Gyu ; Kim, Kyu-Tae
Author_Institution
Center for Electr., Korea Res. Inst. of Stand. & Sci., Daejeon, South Korea
fYear
2012
fDate
1-6 July 2012
Firstpage
384
Lastpage
385
Abstract
This paper reports the results of an ongoing bilateral key comparison at 10 kΩ resistance standards between KRISS and the BIPM. Two 10 kΩ travelling resistance standards of the BIPM were measured at KRISS against a 100 Ω transfer standard by using a homemade cryogenic current comparator (CCC) bridge system. The value of the transfer standard resistor maintained at KRISS is calibrated against the quantized Hall resistance at plateau i = 2 using the same CCC. The measurement result shows that the equivalence of about -1 × 10-9 in the resistance calibrations between the two institutions is much smaller than the measurement uncertainty of 32 × 10-9(k=2).
Keywords
Hall effect; electric resistance measurement; measurement standards; measurement uncertainty; BIPM; KRISS; bilateral comparison; cryogenic current comparator bridge system; measurement uncertainty; quantized Hall resistance; resistance 10 kohm; resistance standards; Current measurement; Electrical resistance measurement; Resistance; Resistors; Standards; Temperature measurement; Uncertainty; cryogenic current comparator; key comparison; measurement uncertainty; quantized Hall resistance; resistance standards;
fLanguage
English
Publisher
ieee
Conference_Titel
Precision Electromagnetic Measurements (CPEM), 2012 Conference on
Conference_Location
Washington, DC
ISSN
0589-1485
Print_ISBN
978-1-4673-0439-9
Type
conf
DOI
10.1109/CPEM.2012.6250964
Filename
6250964
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