Fano resonance membrane reflectors from mid-infrared to far-infrared

Author

Shuai, Yichen ; Zhao, Deyin ; Yang, Weiquan ; Zhou, Weidong ; Seo, Jung-Hun ; Ma, Zhenqiang ; Medhi, Gautam ; Peale, Robert ; Buchwald, Walter ; Soref, Richard

Author_Institution

Dept. of Electr. Eng., Univ. of Texas at Arlington, Arlington, TX, USA

fYear

2011

fDate

9-13 Oct. 2011

Firstpage

787

Lastpage

788

Abstract

The authors report here single layer ultra-compact Si MRs at mid-infrared and far-infrared bands, based on suspended air-clad structure. High performance reflectors were designed for surface- normal incidence with center operation wavelengths of 1.5 μm, ~ 8 μm, and 75 μm, respectively. Large area patterned membrane reflectors were also fabricated and transferred onto glass substrates based on PDMS stamp assisted membrane transfer process. Close to 100% reflection was obtained at ~76 μm, with a single layer Si membrane thickness of 18 μm.

Keywords

electron spin polarisation; elemental semiconductors; infrared spectra; optical fibre cladding; optical glass; photoemission; silicon; Fano resonance membrane reflectors; PDMS stamp; Si membrane reflectors; far-infrared bands; glass substrates; mid-infrared bands; patterned membrane reflectors; single layer ultra-compact membrane reflectors; surface-normal incidence; suspended air-clad structure; Broadband communication; Glass; Reflection; Semiconductor device measurement; Silicon; Substrates; Wavelength measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Photonics Conference (PHO), 2011 IEEE

Conference_Location

Arlington, VA

Print_ISBN

978-1-4244-8940-4

Type

conf

DOI

10.1109/PHO.2011.6110791

Filename

6110791