Title : 
Single crystal silicon rotational micromotors
         
        
            Author : 
Suzuki, Kenichiro ; Tanigawa, Hiroshi
         
        
            Author_Institution : 
NEC Corp., Kanagawa, Japan
         
        
        
            fDate : 
30 Jan-2 Feb 1991
         
        
        
        
            Abstract : 
Three types of rotational micromotors, stepping, harmonic, and gyro-like side-drives, are presented. The rotors, poles, and stators are made of a thick single crystal silicon layer by using boron-diffused silicon etch stop to define the thickness and using anisotropic dry etching to form narrow and deep separation gaps. The rotor stoppers are fabricated by polysilicon trench filling and sacrificial layer etching processes. The silicon chips are electrostatically bonded onto glass chips, followed by unmasked wafer dissolution, freeing the rotors so that they can move. The novel process successfully provided micromotors with a 50 μm diameter rotor
         
        
            Keywords : 
boron; elemental semiconductors; etching; micromechanical devices; silicon; small electric machines; stepping motors; 50 micron; Si:B; anisotropic dry etching; etch stop; gyro-like side-drives; harmonic motors; polysilicon trench filling; rotational micromotors; rotors; sacrificial layer etching processes; separation gaps; stators; stepping motors; unmasked wafer dissolution; Bonding; Dry etching; Fabrication; Filling; Glass; Laboratories; Microactuators; Micromotors; National electric code; Silicon;
         
        
        
        
            Conference_Titel : 
Micro Electro Mechanical Systems, 1991, MEMS '91, Proceedings. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots. IEEE
         
        
            Conference_Location : 
Nara
         
        
            Print_ISBN : 
0-87942-641-1
         
        
        
            DOI : 
10.1109/MEMSYS.1991.114762