• DocumentCode
    275330
  • Title

    Single crystal silicon rotational micromotors

  • Author

    Suzuki, Kenichiro ; Tanigawa, Hiroshi

  • Author_Institution
    NEC Corp., Kanagawa, Japan
  • fYear
    1991
  • fDate
    30 Jan-2 Feb 1991
  • Firstpage
    15
  • Lastpage
    20
  • Abstract
    Three types of rotational micromotors, stepping, harmonic, and gyro-like side-drives, are presented. The rotors, poles, and stators are made of a thick single crystal silicon layer by using boron-diffused silicon etch stop to define the thickness and using anisotropic dry etching to form narrow and deep separation gaps. The rotor stoppers are fabricated by polysilicon trench filling and sacrificial layer etching processes. The silicon chips are electrostatically bonded onto glass chips, followed by unmasked wafer dissolution, freeing the rotors so that they can move. The novel process successfully provided micromotors with a 50 μm diameter rotor
  • Keywords
    boron; elemental semiconductors; etching; micromechanical devices; silicon; small electric machines; stepping motors; 50 micron; Si:B; anisotropic dry etching; etch stop; gyro-like side-drives; harmonic motors; polysilicon trench filling; rotational micromotors; rotors; sacrificial layer etching processes; separation gaps; stators; stepping motors; unmasked wafer dissolution; Bonding; Dry etching; Fabrication; Filling; Glass; Laboratories; Microactuators; Micromotors; National electric code; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 1991, MEMS '91, Proceedings. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots. IEEE
  • Conference_Location
    Nara
  • Print_ISBN
    0-87942-641-1
  • Type

    conf

  • DOI
    10.1109/MEMSYS.1991.114762
  • Filename
    114762