Title :
Fabrication of assembled micromechanical components via deep X-ray lithography
Author :
Guckel, H. ; Skrobis, K.J. ; Christenson, T.R. ; Klein, J. ; Han, S. ; Choi, B. ; Lovell, E.G.
Author_Institution :
Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI, USA
fDate :
30 Jan-2 Feb 1991
Abstract :
A variant of deep X-ray lithography, the LIGA process, is described. The fundamental processing sequence has been augmented with a locally defined sacrificial polyimide layer. This requires alignment of the X-ray mask to the optically defined sacrificial pattern via specially developed align-and-clamping jigs. The end results of this process are either fully unsupported metal structures or components which are locally attached to the substrate. Attempts to use this type of processing to produce assembled devices have been successful. Thus, free gears and fully attached shafts have been connected to form a nickel gear box. More complex assembly experiments have been completed successfully and are encouraging enough to pursue this approach further
Keywords :
X-ray lithography; masks; micromechanical devices; LIGA process; X-ray mask; align-and-clamping jigs; assembled devices; deep X-ray lithography; free gears; fully attached shafts; locally defined sacrificial polyimide layer; micromechanical components; nickel gear box; Additives; Assembly; Etching; Fabrication; Gears; Micromachining; Micromechanical devices; Resists; Silicon; X-ray lithography;
Conference_Titel :
Micro Electro Mechanical Systems, 1991, MEMS '91, Proceedings. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots. IEEE
Conference_Location :
Nara
Print_ISBN :
0-87942-641-1
DOI :
10.1109/MEMSYS.1991.114772