• DocumentCode
    275333
  • Title

    Fabrication of assembled micromechanical components via deep X-ray lithography

  • Author

    Guckel, H. ; Skrobis, K.J. ; Christenson, T.R. ; Klein, J. ; Han, S. ; Choi, B. ; Lovell, E.G.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI, USA
  • fYear
    1991
  • fDate
    30 Jan-2 Feb 1991
  • Firstpage
    74
  • Lastpage
    79
  • Abstract
    A variant of deep X-ray lithography, the LIGA process, is described. The fundamental processing sequence has been augmented with a locally defined sacrificial polyimide layer. This requires alignment of the X-ray mask to the optically defined sacrificial pattern via specially developed align-and-clamping jigs. The end results of this process are either fully unsupported metal structures or components which are locally attached to the substrate. Attempts to use this type of processing to produce assembled devices have been successful. Thus, free gears and fully attached shafts have been connected to form a nickel gear box. More complex assembly experiments have been completed successfully and are encouraging enough to pursue this approach further
  • Keywords
    X-ray lithography; masks; micromechanical devices; LIGA process; X-ray mask; align-and-clamping jigs; assembled devices; deep X-ray lithography; free gears; fully attached shafts; locally defined sacrificial polyimide layer; micromechanical components; nickel gear box; Additives; Assembly; Etching; Fabrication; Gears; Micromachining; Micromechanical devices; Resists; Silicon; X-ray lithography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 1991, MEMS '91, Proceedings. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots. IEEE
  • Conference_Location
    Nara
  • Print_ISBN
    0-87942-641-1
  • Type

    conf

  • DOI
    10.1109/MEMSYS.1991.114772
  • Filename
    114772