DocumentCode
2753832
Title
Broad area semiconductor lasers with tailored gain
Author
Qiao, Zhongliang ; Zhang, Siyu ; Gao, Xin ; Li, Zhanguo ; Lu, Peng ; Hui Lie ; Qu, Yi ; Lui, GuoJun ; Bo, Baoxue
Author_Institution
State Key Lab. on High Power Semi-conductor Lasers, Changchun Univ. of Sci. & Technol., Changchun, China
fYear
2010
fDate
July 28 2010-Aug. 1 2010
Firstpage
90
Lastpage
92
Abstract
According to the principle of carrier diffusion, we fabricated an electric pattern high power single quantum well broad area semiconductor laser. The designed devices have special current injection stripe which forms Gaussian-like photon gain laterally. Utilizing this principle, tailored gain lasers exhibiting near single lobe far field patterns were found. The tailored gain lasers emitting at 808 nm with the measured full width at half maximum angle of 4.1°, the maximum continuous wave output power up to 3.4W, and slope efficiency as high as 0.89 W/A were reported. The beam quality of the broad area semiconductor single quantum well laser has been improved obviously by the designed devices.
Keywords
Gaussian distribution; carrier lifetime; laser beams; quantum well lasers; Gaussian-like photon gain; beam quality; broad area semiconductor lasers; carrier diffusion; current injection stripe; electric pattern high power semiconductor laser; near single lobe far field patterns; single quantum well semiconductor laser; slope efficiency; tailored gain; wavelength 808 nm; Electrodes; Laser beams; Measurement by laser beam; Power lasers; Surface emitting lasers; broad area semiconductor lasers; distributed electrode; photon gain;
fLanguage
English
Publisher
ieee
Conference_Titel
Laser Physics and Laser Technologies (RCSLPLT) and 2010 Academic Symposium on Optoelectronics Technology (ASOT), 2010 10th Russian-Chinese Symposium on
Conference_Location
Harbin
Print_ISBN
978-1-4244-5511-9
Type
conf
DOI
10.1109/RCSLPLT.2010.5615398
Filename
5615398
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