Abstract :
The following topics are dealt with: advanced semiconductor thermal processing; laser annealing; plasma nitridation; ULSI; plasma doping; leakage currents; and MOSFET
Keywords :
MOSFET; ULSI; annealing; leakage currents; nitridation; plasma materials processing; semiconductor doping; MOSFET; ULSI; laser annealing; leakage currents; plasma doping; plasma nitridation; semiconductor thermal processing;
Conference_Titel :
Advanced Thermal Processing of Semiconductors, 2006. RTP '06. 14th IEEE International Conference on
Conference_Location :
Kyoto
Print_ISBN :
1-4244-0648-X
DOI :
10.1109/RTP.2006.367963
