DocumentCode
2753999
Title
Growing Importance of Fundamental Understanding of the Source of Process Variations
Author
Sato, Susumu
Author_Institution
NEC Yamagata Ltd.
fYear
2006
fDate
10-13 Oct. 2006
Firstpage
5
Lastpage
9
Abstract
Statistical process control (SPC) has been widely practiced as a quality control method in the semiconductor industry. SPC is a system for monitoring, controlling, and improving a process through statistical analysis of monitored data. Control charts are widely used for process monitoring, but they are often misinterpreted. To improve process capability, the source of process variations must be properly identified from the control charts for proper feedback. Since the process tolerance is getting increasingly narrow, the importance of fundamental understanding of the source of process variations is an imperative. By eliminating or reducing process variation, a small improvement in process capability, can have a very significant business impact
Keywords
process monitoring; quality control; semiconductor device manufacture; statistical analysis; statistical process control; control charts; process capability; process controlling; process monitoring; process tolerance; process variations; quality control; semiconductor industry; statistical analysis; statistical process control; Companies; Continuous improvement; Control charts; Control systems; Electronics industry; Gaussian distribution; Manufacturing industries; Monitoring; Process control; Statistical analysis;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Thermal Processing of Semiconductors, 2006. RTP '06. 14th IEEE International Conference on
Conference_Location
Kyoto
Print_ISBN
1-4244-0648-X
Electronic_ISBN
1-4244-0649-8
Type
conf
DOI
10.1109/RTP.2006.367975
Filename
4223102
Link To Document