Title :
Saturated laser of Ne-like argon and Xe-based extreme ultraviolet source radiated from capillary discharge plasma
Author :
Zhao, Yongpeng ; Wang, Qi ; Xie, Yao ; Qiang, Xu ; Jiang, Shan ; Li, Qi
Author_Institution :
Nat. Key Lab. of Sci. & Technol. on Tunable Laser, Harbin Inst. of Technol., Harbin, China
fDate :
July 28 2010-Aug. 1 2010
Abstract :
In this paper, we report the saturated soft x-ray laser at 46.9nm in Ne-like Ar ions and extreme ultraviolet source at 13.5nm in Xe10+ ions emitted from capillary discharge plasma. The 46.9nm laser is achieved with the initial pressure between 16Pa and 32Pa. The saturated laser is obtained with peak current of 20kA and initial pressure of 26Pa. The small signal gain coefficient of 0.6cm-1 is measured. In the other capillary discharge device, the extreme ultraviolet (EUV) lithography light source at 13.5 nm is realized with Xe10+. The source is driven by pulse current of 35kA and pulse duration of 132ns.
Keywords :
discharges (electric); neon; plasma X-ray sources; plasma devices; plasma diagnostics; plasma light propagation; plasma pressure; xenon; Ne; Xe; Xe-based extreme ultraviolet source; capillary discharge plasma; ion emission; pressure 16 Pa to 32 Pa; pulse current; signal gain coefficient; soft x-ray laser; ultraviolet lithography; wavelength 13.5 nm; wavelength 46.9 nm; Argon; Discharges; Fault location; Plasmas; Ultraviolet sources; X-ray lasers; 13.5nm; 46.9nm; capillary discharge; extreme ultraviolet source; soft x-ray laser;
Conference_Titel :
Laser Physics and Laser Technologies (RCSLPLT) and 2010 Academic Symposium on Optoelectronics Technology (ASOT), 2010 10th Russian-Chinese Symposium on
Conference_Location :
Harbin
Print_ISBN :
978-1-4244-5511-9
DOI :
10.1109/RCSLPLT.2010.5615423
