Title :
Plasma torch device for micro-machining applications
Author_Institution :
Dept. of Accel. & Ion Sources, Atomic Energy Authority, Cairo, Egypt
Abstract :
The construction of a plasma torch device, which is suitable for ion etching and thinning applications has been described. The device consists of a stainless steel anode rod with a coaxial floating cylinder around it. The cylinder has an aperture on its surface for mechanical confinement of the discharge. The cathode target is placed opposing this aperture for micro machining with ion densities of the order of 160 mA/cm2. N2, Ar and He gases are tested using discharge voltages equal to 1.92, 2.3 and 1.56 KV respectively and at a pressure of 2.6×10-4 torr
Keywords :
micromachining; plasma torches; sputter etching; 1.56 kV; 1.92 kV; 2.3 kV; 2.6E-4 torr; cathode target; coaxial floating cylinder; densities; discharge voltages; ion etching; mechanical confinement; micro-machining applications; plasma torch device; pressure; stainless steel anode rod; thinning; Anodes; Apertures; Cathodes; Coaxial components; Etching; Plasma applications; Plasma confinement; Plasma devices; Steel; Surface discharges;
Conference_Titel :
Radio Science Conference, 1999. NRSC '99. Proceedings of the Sixteenth National
Conference_Location :
Cairo
Print_ISBN :
977-5031-62-1
DOI :
10.1109/NRSC.1999.760948
