DocumentCode
2757783
Title
Vdd gate biasing RF CMOS amplifier design technique based on the effect of carrier velocity saturation
Author
Ishihara, Noboru
Author_Institution
Gunma University, Graduate School of Engineering, Electronics and Computing, 1-5-1 Tenjin-cho, Kiryu-shi, Pref. 376-8515, Japan
fYear
2006
fDate
12-15 Dec. 2006
Firstpage
137
Lastpage
140
Abstract
RF CMOS amplifier design technique using the carrier velocity saturation region on the drain current of the MOS transistor aggressively has been proposed. By setting the transistor gate bias to the power supply voltage (Vdd), stable operation against Vdd variations can be achieved with a simple circuit configuration. By using the technique, a 5 GHz amplifier has been designed and fabricated by using 0.18-μm CMOS process technology. The chip has been operated with a gain variation less than 1 dB having a peak gain of 13.5 dB when Vdd has been changed from 1.2 to 2.9 V. Input and output matching variations are 1 dB and 3 dB with minimum values of ™10.2 dB and ™ 11.5 dB respectively.
Keywords
CMOS process; CMOS technology; Circuits; Gain; Impedance matching; MOSFETs; Power supplies; Radio frequency; Radiofrequency amplifiers; Voltage; Amplifiers; Carrier velocity saturation; Gate bias circuits; RF-CMOS;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference, 2006. APMC 2006. Asia-Pacific
Conference_Location
Yokohama, Japan
Print_ISBN
978-4-902339-08-6
Electronic_ISBN
978-4-902339-11-6
Type
conf
DOI
10.1109/APMC.2006.4429394
Filename
4429394
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