• DocumentCode
    2757783
  • Title

    Vdd gate biasing RF CMOS amplifier design technique based on the effect of carrier velocity saturation

  • Author

    Ishihara, Noboru

  • Author_Institution
    Gunma University, Graduate School of Engineering, Electronics and Computing, 1-5-1 Tenjin-cho, Kiryu-shi, Pref. 376-8515, Japan
  • fYear
    2006
  • fDate
    12-15 Dec. 2006
  • Firstpage
    137
  • Lastpage
    140
  • Abstract
    RF CMOS amplifier design technique using the carrier velocity saturation region on the drain current of the MOS transistor aggressively has been proposed. By setting the transistor gate bias to the power supply voltage (Vdd), stable operation against Vdd variations can be achieved with a simple circuit configuration. By using the technique, a 5 GHz amplifier has been designed and fabricated by using 0.18-μm CMOS process technology. The chip has been operated with a gain variation less than 1 dB having a peak gain of 13.5 dB when Vdd has been changed from 1.2 to 2.9 V. Input and output matching variations are 1 dB and 3 dB with minimum values of ™10.2 dB and ™ 11.5 dB respectively.
  • Keywords
    CMOS process; CMOS technology; Circuits; Gain; Impedance matching; MOSFETs; Power supplies; Radio frequency; Radiofrequency amplifiers; Voltage; Amplifiers; Carrier velocity saturation; Gate bias circuits; RF-CMOS;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference, 2006. APMC 2006. Asia-Pacific
  • Conference_Location
    Yokohama, Japan
  • Print_ISBN
    978-4-902339-08-6
  • Electronic_ISBN
    978-4-902339-11-6
  • Type

    conf

  • DOI
    10.1109/APMC.2006.4429394
  • Filename
    4429394