DocumentCode :
2757783
Title :
Vdd gate biasing RF CMOS amplifier design technique based on the effect of carrier velocity saturation
Author :
Ishihara, Noboru
Author_Institution :
Gunma University, Graduate School of Engineering, Electronics and Computing, 1-5-1 Tenjin-cho, Kiryu-shi, Pref. 376-8515, Japan
fYear :
2006
fDate :
12-15 Dec. 2006
Firstpage :
137
Lastpage :
140
Abstract :
RF CMOS amplifier design technique using the carrier velocity saturation region on the drain current of the MOS transistor aggressively has been proposed. By setting the transistor gate bias to the power supply voltage (Vdd), stable operation against Vdd variations can be achieved with a simple circuit configuration. By using the technique, a 5 GHz amplifier has been designed and fabricated by using 0.18-μm CMOS process technology. The chip has been operated with a gain variation less than 1 dB having a peak gain of 13.5 dB when Vdd has been changed from 1.2 to 2.9 V. Input and output matching variations are 1 dB and 3 dB with minimum values of ™10.2 dB and ™ 11.5 dB respectively.
Keywords :
CMOS process; CMOS technology; Circuits; Gain; Impedance matching; MOSFETs; Power supplies; Radio frequency; Radiofrequency amplifiers; Voltage; Amplifiers; Carrier velocity saturation; Gate bias circuits; RF-CMOS;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference, 2006. APMC 2006. Asia-Pacific
Conference_Location :
Yokohama, Japan
Print_ISBN :
978-4-902339-08-6
Electronic_ISBN :
978-4-902339-11-6
Type :
conf
DOI :
10.1109/APMC.2006.4429394
Filename :
4429394
Link To Document :
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