Title :
Multiple-reflector lasers for photonic integrations
Author :
Ara, Shigehisa ; Raj, Mothi Madhan ; Wiedmann, Jörg
Author_Institution :
Res. Center for Quantum Effect Electron., Tokyo Inst. of Technol., Japan
Abstract :
For photonic integration of many lasers and electro-optic devices on a single chip, high quality deep etching technology is one of the promising key technologies. For this purpose, new types of lasers consisting of semiconductor/air mirrors and semiconductor/polymer buried groove mirrors, such as multiple-micro-cavity (MMC) lasers and distributed Bragg reflector (DBR) lasers have been investigated. We proposed the use of a low-loss polymer embedded in the DBR structure, which acts as a high reflective multiple reflector on one side of the laser, for a reduction of the diffraction loss and the construction of robust DBR lasers. The reflectivity of 3λ/4-semiconductor/benzocyclobutene (BCB) DBR GaInAsP/InP lasers with emission at 1.55 pm wavelength was measured to be >90% from their threshold dependence on the cavity length and the ratio of output powers from the cleaved (front) and the DBR (rear) facets. The BCB polymer is recently a very attractive material for numerous passive opto-electronic devices such as optical waveguides, filters, matrix switches, spot-size converters, and so on. We review the fabrication and lasing characteristics of such deeply etched DBR lasers, and present new types of single-mode lasers consisting of a coupled-cavity and DFB/DBR structures
Keywords :
III-V semiconductors; distributed Bragg reflector lasers; distributed feedback lasers; etching; gallium arsenide; gallium compounds; indium compounds; integrated optics; laser beams; laser cavity resonators; laser feedback; laser mirrors; laser modes; optical fabrication; optical polymers; reflectivity; semiconductor lasers; 1.55 mum; DBR facets; DBR structure; DBR structures; DFB structures; DFB/DBR structures; GaInAsP-InP; GaInAsP/InP lasers; cavity length; cleaved facets; coupled-cavity; deeply etched DBR lasers; diffraction loss; distributed Bragg reflector lasers; electro-optic devices; fabrication; filters; front facets; high quality deep etching technology; high reflective multiple reflector; lasers; lasing characteristics; low-loss polymer; matrix switches; multiple-micro-cavity lasers; multiple-reflector lasers; optical waveguides; output powers; passive opto-electronic devices; photonic integrations; rear facets; reflectivity; review; robust DBR lasers; semiconductor/air mirrors; semiconductor/polymer buried groove mirrors; single chip; single-mode lasers; spot-size converters; threshold dependence; Distributed Bragg reflectors; Etching; Lasers and electrooptics; Matrix converters; Mirrors; Optical devices; Optical filters; Optical polymers; Optical waveguides; Semiconductor lasers;
Conference_Titel :
Lasers and Electro-Optics Society 2000 Annual Meeting. LEOS 2000. 13th Annual Meeting. IEEE
Conference_Location :
Rio Grande
Print_ISBN :
0-7803-5947-X
DOI :
10.1109/LEOS.2000.893934