DocumentCode :
2758935
Title :
Numerical investigation on thermal characteristics of GaN HFETs for high power applications
Author :
Xu, Jianfeng ; Yin, Wen-Yan ; Mao, Junfa
Author_Institution :
Shanghai Jiao Tong Univ., Shanghai
fYear :
2006
fDate :
12-15 Dec. 2006
Firstpage :
433
Lastpage :
436
Abstract :
In this paper, numerical investigation on GaN HFETs is carried out using hybrid finite element method (FEM) which combines the FEM with the preconditioned conjugated gradient technique. The maximum temperatures of the HFETs operating under continuous-waves (CW) and pulsed-waves (PW) are both captured accurately. The effects of temperature- dependent thermal conductivities of the materials on the temperature distribution are also studied and compared for different substrate materials, such as sapphire, silicon, and SiC.
Keywords :
III-V semiconductors; conjugate gradient methods; finite element analysis; gallium compounds; power HEMT; temperature distribution; thermal conductivity; wide band gap semiconductors; FEM; GaN; HFET; continuous-waves; high power applications; hybrid finite element method; numerical investigation; preconditioned conjugated gradient technique; pulsed-waves; temperature distribution; thermal characteristics; thermal conductivity effects; Aluminum gallium nitride; Conducting materials; Gallium nitride; HEMTs; MODFETs; Microwave theory and techniques; Silicon carbide; Temperature distribution; Thermal conductivity; Transient analysis; GaN HFETs; hybrid FEM; maximum temperature; power density; temperature distribution; thermal characteristics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference, 2006. APMC 2006. Asia-Pacific
Conference_Location :
Yokohama
Print_ISBN :
978-4-902339-08-6
Electronic_ISBN :
978-4-902339-11-6
Type :
conf
DOI :
10.1109/APMC.2006.4429456
Filename :
4429456
Link To Document :
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