DocumentCode
2758944
Title
Science and technology of ultra clean systems
Author
Ohmi, Tadahiro
Author_Institution
Dept. of Electron., Tohoku Univ., Sendai, Japan
fYear
1989
fDate
17-19 May 1989
Firstpage
327
Lastpage
331
Abstract
The author argues that the semiconductor industry has grown as a result of borrowing a number of basic technologies from other fields. However, it is now time that the industry develop its own technologies for semiconductor manufacturing. In order to integrate a variety of technology fields, where terminologies are so different from one field to the other, into advanced semiconductor technology, a clearly stated leading principle is needed. Ultraclean technology as a leading principle is examined, and ultraclean processing technology is outlined
Keywords
integrated circuit technology; semiconductor technology; semiconductor industry; semiconductor manufacturing; ultra clean systems; ultraclean processing technology; Aluminum; Electronics industry; Integrated circuit technology; Lead compounds; Production; Semiconductor device manufacture; Speech processing; Sputtering; Terminology; Ultra large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, Systems and Applications, 1989. Proceedings of Technical Papers. 1989 International Symposium on
Conference_Location
Taipei
Type
conf
DOI
10.1109/VTSA.1989.68639
Filename
68639
Link To Document