DocumentCode :
2758956
Title :
Tantalum oxide thin-film capacitor suitable for being incorporated into an integrated circuit package
Author :
Yoshino, Hiroshi ; Ihara, Tomohiko ; Yamanaka, Shosaku ; Igarashi, Tadashi
Author_Institution :
Sumitomo Electr. Ind. Ltd., Hyogo, Japan
fYear :
1989
fDate :
26-28 Apr 1989
Firstpage :
156
Lastpage :
159
Abstract :
The authors have developed a tantalum oxide thin-film capacitor that is compatible with die-bonding by gold-silicon solder and hermetic glass-sealed packaging. Its lower electrode is a metal plate, and the upper one is a metal thin film. A Ta2O5 thin-film capacitor that uses a rolled tape of iron-42% nickel alloy as the metal plate and aluminium as the metal thin film is described. This capacitor can withstand a temperature of 500°C for more than ten minutes. Its thermal coefficient of capacitance is less than 400 p.p.m./°C in the range from 25°C to 150°C. The dependence of capacitance on frequency is very small in the range from 1 MHz to 1 GHz. The dielectric loss tangent is less than 0.5% at 1 MHz. The authors compared with Ta 2O5 thin-film capacitor´s performance with that of a barium-titanate-based single-layer chip capacitor by measuring the gain of an amplifier composed of an amplifier IC chip and a capacitor in a leadless chip carrier package. Incorporating Ta2O5 thin-film capacitors into the IC package was confirmed to be a more effective decoupling technique, particularly above than 100 Mhz
Keywords :
loss angle; packaging; tantalum compounds; thin film capacitors; 1 MHz to 1 GHz; 25 to 150 degC; 500 degC; Al; Fe-Ni; Ta2O5; decoupling technique; die-bonding; dielectric loss tangent; gain; hermetic glass-sealed packaging; integrated circuit package; leadless chip carrier; metal plate; metal thin film; rolled tape; thermal coefficient of capacitance; Aluminum; Capacitance; Capacitors; Dielectric losses; Electrodes; Frequency; Integrated circuit packaging; Nickel alloys; Temperature; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Manufacturing Technology Symposium, 1989, Proceedings. Japan IEMT Symposium, Sixth IEEE/CHMT International
Conference_Location :
Nara
Type :
conf
DOI :
10.1109/IEMTS.1989.76128
Filename :
76128
Link To Document :
بازگشت