• DocumentCode
    2759135
  • Title

    Residual and oscillator phase noise in GaAs metamorphic HEMTs

  • Author

    Ferndahl, Mattias ; Zirath, Herbert

  • Author_Institution
    Chalmers Univ. of Technol., Goteborg
  • fYear
    2006
  • fDate
    12-15 Dec. 2006
  • Firstpage
    472
  • Lastpage
    475
  • Abstract
    Residual phase noise measurements have been carried out on GaAs metamorphic high electron mobility transistors, mHEMT in order to explain phase noise results from mHEMT based VCOs. Noise is measured for several biases and input powers. The measurements show that the residual phase noise is increasing with increasing drain source voltages even in saturation, possibly due to the triggering of impact ionization mechanisms. This increase in noise will act deleterious on the phase noise performance of a VCO that have the drain bias increased in order to achieve higher power in the tank and thus reduce the phase noise. The reduction in phase noise due to higher power in the tank is shown to be counteracted by the increase in residual phase noise from the mHEMTs for higher drain source voltages.
  • Keywords
    III-V semiconductors; gallium arsenide; high electron mobility transistors; impact ionisation; phase noise; voltage-controlled oscillators; GaAs; VCO; drain source voltages; high electron mobility transistors; impact ionization mechanisms; metamorphic HEMT; oscillator phase noise; phase noise measurements; residual phase noise; Gallium arsenide; HEMTs; Impact ionization; MODFETs; Noise measurement; Oscillators; Phase measurement; Phase noise; Voltage; mHEMTs; 1/f noise; GaAs; VCO; mHEMT; metamorphic; pHEMT; residual phase noise;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference, 2006. APMC 2006. Asia-Pacific
  • Conference_Location
    Yokohama
  • Print_ISBN
    978-4-902339-08-6
  • Electronic_ISBN
    978-4-902339-11-6
  • Type

    conf

  • DOI
    10.1109/APMC.2006.4429466
  • Filename
    4429466