DocumentCode
2759135
Title
Residual and oscillator phase noise in GaAs metamorphic HEMTs
Author
Ferndahl, Mattias ; Zirath, Herbert
Author_Institution
Chalmers Univ. of Technol., Goteborg
fYear
2006
fDate
12-15 Dec. 2006
Firstpage
472
Lastpage
475
Abstract
Residual phase noise measurements have been carried out on GaAs metamorphic high electron mobility transistors, mHEMT in order to explain phase noise results from mHEMT based VCOs. Noise is measured for several biases and input powers. The measurements show that the residual phase noise is increasing with increasing drain source voltages even in saturation, possibly due to the triggering of impact ionization mechanisms. This increase in noise will act deleterious on the phase noise performance of a VCO that have the drain bias increased in order to achieve higher power in the tank and thus reduce the phase noise. The reduction in phase noise due to higher power in the tank is shown to be counteracted by the increase in residual phase noise from the mHEMTs for higher drain source voltages.
Keywords
III-V semiconductors; gallium arsenide; high electron mobility transistors; impact ionisation; phase noise; voltage-controlled oscillators; GaAs; VCO; drain source voltages; high electron mobility transistors; impact ionization mechanisms; metamorphic HEMT; oscillator phase noise; phase noise measurements; residual phase noise; Gallium arsenide; HEMTs; Impact ionization; MODFETs; Noise measurement; Oscillators; Phase measurement; Phase noise; Voltage; mHEMTs; 1/f noise; GaAs; VCO; mHEMT; metamorphic; pHEMT; residual phase noise;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference, 2006. APMC 2006. Asia-Pacific
Conference_Location
Yokohama
Print_ISBN
978-4-902339-08-6
Electronic_ISBN
978-4-902339-11-6
Type
conf
DOI
10.1109/APMC.2006.4429466
Filename
4429466
Link To Document