• DocumentCode
    2759849
  • Title

    Application-specific selection of 6T SRAM cells offering superior performance and quality with a triple-threshold-voltage CMOS technology

  • Author

    Zhu, Hong ; Kursun, Volkan

  • Author_Institution
    Dept. of Electron. & Comput. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon, China
  • fYear
    2011
  • fDate
    19-20 July 2011
  • Firstpage
    68
  • Lastpage
    73
  • Abstract
    Conventional six-transistor (6T) memory cell has an intrinsic data stability problem due to directly-accessed storage nodes during a read operation. The data stability issue becomes more severe with increasing variability and decreasing supply voltage in scaled CMOS technologies. Conventional techniques to enhance the data stability of 6T memory cells tend to sacrifice other important figures of merit, such as memory integration density and write ability. 6T SRAM circuits with higher data stability are presented in this paper. An electrical performance metric is evaluated to compare various memory design options targeting different applications. The overall electrical quality is enhanced without increasing the area with a multi-threshold-voltage CMOS technology. A high-threshold-voltage 6T memory cell is recommended for portable devices where lower energy consumption and longer battery lifetime are critically important. Alternatively, a triple-threshold-voltage 6T SRAM cell is recommended for robust memory operation in applications with aggressive speed requirement.
  • Keywords
    CMOS integrated circuits; SRAM chips; SRAM cells; application-specific selection; battery lifetime; directly-accessed storage nodes; electrical performance metric; electrical quality; energy consumption; intrinsic data stability problem; memory design; memory integration density; multithreshold voltage CMOS technology; portable device; robust memory operation; scaled CMOS technology; six-transistor memory cell; supply voltage; triple-threshold-voltage CMOS technology; write ability; Arrays; CMOS integrated circuits; CMOS technology; Circuit stability; Power demand; Random access memory; Transistors; Multi-threshold; battery lifetime; data stability; energy efficiency; leakage power; memory integration density; operation speed; write margin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quality Electronic Design (ASQED), 2011 3rd Asia Symposium on
  • Conference_Location
    Kuala Lumpur
  • Print_ISBN
    978-1-4577-0145-0
  • Type

    conf

  • DOI
    10.1109/ASQED.2011.6111704
  • Filename
    6111704