DocumentCode :
2760160
Title :
IR drop analysis in single- and multi-wall carbon nanotube power interconnects in sub-nanometer designs
Author :
Das, Debaprasad ; Rahaman, Hafizur
Author_Institution :
Sch. of VLSI Technol., Bengal Eng. & Sci. Univ., Shibpur, India
fYear :
2011
fDate :
19-20 July 2011
Firstpage :
174
Lastpage :
183
Abstract :
This paper presents a detailed analysis of the power supply voltage (IR) drop in sub-nanometer designs for local, semi-global, and global lengths. The IR drop in carbon nanotube (CNT) based power interconnects is analyzed and their effects on the timing delay have been investigated. It is shown that the CNT based power interconnects have significantly less IR-drop in comparison to that of Cu based power interconnects for semi-global and global lengths. The interconnect delay is increased by almost ten times for ten fold increase in interconnect length due to IR-drop in Cu wires, whereas that of MWCNT based wires is only ~50% for global lengths.
Keywords :
VLSI; carbon nanotubes; integrated circuit interconnections; IR drop analysis; MWCNT; VLSI; multi-wall carbon nanotube; power interconnects; single-wall carbon nanotube; sub-nanometer designs; Copper; Inductance; Integrated circuit interconnections; Quantum capacitance; Resistance; Carbon Nanotube (CNT); IR drop; Interconnect delay; Multi-wall Carbon Nanotube (MWCNT); Single-wall Carbon Nanotube (SWCNT);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quality Electronic Design (ASQED), 2011 3rd Asia Symposium on
Conference_Location :
Kuala Lumpur
Print_ISBN :
978-1-4577-0145-0
Type :
conf
DOI :
10.1109/ASQED.2011.6111741
Filename :
6111741
Link To Document :
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