• DocumentCode
    2762357
  • Title

    Microstructures and properties of copper thick-films fired under nitrogen atmospheres doped with gaseous oxidizers

  • Author

    Rotman, F. ; Navarro, D. ; Mellul, S. ; Miyasaka, M. ; Aucouturier, J.L.

  • Author_Institution
    L´´Air Liquide, Jouy-en-Josas, France
  • fYear
    1989
  • fDate
    26-28 Apr 1989
  • Firstpage
    255
  • Lastpage
    258
  • Abstract
    The authors studied the effects on copper thick-film systems of several gaseous oxidizers (O2, CO2, N2O, H2O) injected into nitrogen furnace atmospheres, either throughout the whole furnace or only into its burnout zone. SEM (scanning electron microscopy) examinations of the copper film microstructures correlated with properties such as adhesion, solderability, and resistivity allows the establishment of ideal firing atmosphere conditions for copper thick-film manufacturing: namely, it is necessary to restrict the atmosphere doping to the burnout zone; and oxygen and water vapor are the more effective gaseous dopants. Specific equipment has been developed to control injection of these dopants into the furnace atmosphere
  • Keywords
    copper; furnaces; scanning electron microscopy; soldering; thick film circuits; CO2; Cu thick film systems; N2; N2O; O2; SEM; adhesion; burnout zone; firing atmosphere conditions; furnace atmospheres; gaseous dopants; resistivity; solderability; thick-film manufacturing; Adhesives; Atmosphere; Conductivity; Copper; Firing; Furnaces; Manufacturing; Microstructure; Nitrogen; Scanning electron microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Manufacturing Technology Symposium, 1989, Proceedings. Japan IEMT Symposium, Sixth IEEE/CHMT International
  • Conference_Location
    Nara
  • Type

    conf

  • DOI
    10.1109/IEMTS.1989.76151
  • Filename
    76151