DocumentCode
2762357
Title
Microstructures and properties of copper thick-films fired under nitrogen atmospheres doped with gaseous oxidizers
Author
Rotman, F. ; Navarro, D. ; Mellul, S. ; Miyasaka, M. ; Aucouturier, J.L.
Author_Institution
L´´Air Liquide, Jouy-en-Josas, France
fYear
1989
fDate
26-28 Apr 1989
Firstpage
255
Lastpage
258
Abstract
The authors studied the effects on copper thick-film systems of several gaseous oxidizers (O2, CO2, N2O, H2O) injected into nitrogen furnace atmospheres, either throughout the whole furnace or only into its burnout zone. SEM (scanning electron microscopy) examinations of the copper film microstructures correlated with properties such as adhesion, solderability, and resistivity allows the establishment of ideal firing atmosphere conditions for copper thick-film manufacturing: namely, it is necessary to restrict the atmosphere doping to the burnout zone; and oxygen and water vapor are the more effective gaseous dopants. Specific equipment has been developed to control injection of these dopants into the furnace atmosphere
Keywords
copper; furnaces; scanning electron microscopy; soldering; thick film circuits; CO2; Cu thick film systems; N2; N2O; O2; SEM; adhesion; burnout zone; firing atmosphere conditions; furnace atmospheres; gaseous dopants; resistivity; solderability; thick-film manufacturing; Adhesives; Atmosphere; Conductivity; Copper; Firing; Furnaces; Manufacturing; Microstructure; Nitrogen; Scanning electron microscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Manufacturing Technology Symposium, 1989, Proceedings. Japan IEMT Symposium, Sixth IEEE/CHMT International
Conference_Location
Nara
Type
conf
DOI
10.1109/IEMTS.1989.76151
Filename
76151
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