DocumentCode :
2762357
Title :
Microstructures and properties of copper thick-films fired under nitrogen atmospheres doped with gaseous oxidizers
Author :
Rotman, F. ; Navarro, D. ; Mellul, S. ; Miyasaka, M. ; Aucouturier, J.L.
Author_Institution :
L´´Air Liquide, Jouy-en-Josas, France
fYear :
1989
fDate :
26-28 Apr 1989
Firstpage :
255
Lastpage :
258
Abstract :
The authors studied the effects on copper thick-film systems of several gaseous oxidizers (O2, CO2, N2O, H2O) injected into nitrogen furnace atmospheres, either throughout the whole furnace or only into its burnout zone. SEM (scanning electron microscopy) examinations of the copper film microstructures correlated with properties such as adhesion, solderability, and resistivity allows the establishment of ideal firing atmosphere conditions for copper thick-film manufacturing: namely, it is necessary to restrict the atmosphere doping to the burnout zone; and oxygen and water vapor are the more effective gaseous dopants. Specific equipment has been developed to control injection of these dopants into the furnace atmosphere
Keywords :
copper; furnaces; scanning electron microscopy; soldering; thick film circuits; CO2; Cu thick film systems; N2; N2O; O2; SEM; adhesion; burnout zone; firing atmosphere conditions; furnace atmospheres; gaseous dopants; resistivity; solderability; thick-film manufacturing; Adhesives; Atmosphere; Conductivity; Copper; Firing; Furnaces; Manufacturing; Microstructure; Nitrogen; Scanning electron microscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Manufacturing Technology Symposium, 1989, Proceedings. Japan IEMT Symposium, Sixth IEEE/CHMT International
Conference_Location :
Nara
Type :
conf
DOI :
10.1109/IEMTS.1989.76151
Filename :
76151
Link To Document :
بازگشت