DocumentCode
2766200
Title
Curved SU-8 structure fabrication based on the acid-diffusion effect
Author
Chen, Qiang ; Li, Gang ; Zhao, Jianlong
Author_Institution
State Key Lab. of Transducer Technol., Chinese Acad. of Sci., Shanghai, China
fYear
2011
fDate
23-27 Jan. 2011
Firstpage
225
Lastpage
228
Abstract
This paper proposes a novel technology to fabricate 3D curved structures on SU-8 resist by a photo-acid-diffusion process. This technology deliberately modifies the standard SU-8 photolithography procedure and allows the diffusion of photo-acid released from UV-exposed regions into the adjacent unexposed resist regions, which would result in forming smooth 3D curved structures after cross-linking and development. The formation mechanism of curved SU-8 structure is demonstrated by experiments and numerical simulation.
Keywords
micromechanical devices; numerical analysis; photolithography; 3D curved SU-8 structure fabrication; SU-8 photolithography procedure; UV-exposed region; acid-diffusion effect; cross-linking; numerical simulation; photo-acid; photo-acid-diffusion process; Fabrication; Films; Lithography; Mathematical model; Resists; Solvents; Three dimensional displays;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems (MEMS), 2011 IEEE 24th International Conference on
Conference_Location
Cancun
ISSN
1084-6999
Print_ISBN
978-1-4244-9632-7
Type
conf
DOI
10.1109/MEMSYS.2011.5734402
Filename
5734402
Link To Document