Tapered Undercut-Etching-Active-Region for Integrating Spot-Size Converter and Electroabsorption Modulator

Author

Lin, Fang-Zheng ; Tsai, Shun-An ; Wu, Tsu-Hsiu ; You, Jia-Shun ; Chiu, Yi-Jen

Author_Institution

Nat. Sun Yat-Sen Univ., Kaohsiung

fYear

2006

fDate

6-8 Dec. 2006

Firstpage

236

Lastpage

238

Abstract

A new structure integrating traveling-wave electroabsorption modulator (TWEAM) with optical spot-size converter (SSC) was proposed. The active waveguide was formed by using selectively undercut-wet-etching-active-region (UEAR) method, which can avoid the submicron photolithography of tapered active waveguide in the SSC region. About 5 dB improvement in optical insertion loss is measured, resulting from small 5.7deg (horizontal)x 8.8deg (vertical) beam divergence angles and large plusmn 2.9 mum (horizontal) x plusmn2.2 mum (vertical) 1 dB alignment tolerances from the SSC facet. 18 GHz of -3 dB bandwidth and modulation efficiency of 20 dB/V can be obtained in this device.

Keywords

electro-optical modulation; etching; integrated optoelectronics; optical losses; optical waveguides; optical wavelength conversion; alignment tolerances; beam divergence angles; frequency 18 GHz; modulation efficiency; optical insertion loss; optical spot-size converter; submicron photolithography; tapered active waveguide; tapered undercut-etching-active-region; traveling-wave electroabsorption modulator; undercut-wet-etching-active-region method; Etching; High speed optical techniques; Indium phosphide; Insertion loss; Integrated optics; Optical coupling; Optical fibers; Optical modulation; Optical waveguides; Semiconductor waveguides;

fLanguage

English

Publisher

ieee

Conference_Titel

Optoelectronic and Microelectronic Materials and Devices, 2006 Conference on

Conference_Location

Perth, WA

Print_ISBN

978-1-4244-0578-7

Electronic_ISBN

978-1-4244-0578-7

Type

conf

DOI

10.1109/COMMAD.2006.4429924

Filename

4429924