• DocumentCode
    2767189
  • Title

    Experimental verification of internal friction at GHZ frequencies in doped single-crystal silicon

  • Author

    Hwang, Eugene ; Bhave, Sunil A.

  • Author_Institution
    OxideMEMS Lab., Cornell Univ., Ithaca, NY, USA
  • fYear
    2011
  • fDate
    23-27 Jan. 2011
  • Firstpage
    424
  • Lastpage
    427
  • Abstract
    This paper reports on the experimental verification of the intrinsic loss mechanisms present in degenerately doped single-crystal silicon. Previous work reported at the Hilton Head Workshop 2010 experimentally showed the dominant acoustic loss mechanism in a 3.72-GHz silicon resonator (Fig. 1) to be Landau-Rumer phonon-phonon dissipation as seen from the 1/T4 temperature dependence for temperatures as low as 77K. This work extends these measurements to lower temperature (1.5K) and finds that free electron scattering due to degenerate doping affects the Q of silicon micromechanical resonators at low temperatures and in some cases, such as in the current resonator design, becomes comparable to anchor loss even at room temperature.
  • Keywords
    elemental semiconductors; internal friction; micromechanical resonators; phonon-phonon interactions; semiconductor doping; silicon; temperature measurement; GHz frequency; Hilton Head Workshop 2010; Landau-Rumer phonon-phonon dissipation; Si:Jk; acoustic loss mechanism; doped single-crystal silicon; free electron scattering; frequency 3.72 GHz; internal friction; silicon micromechanical resonators; silicon resonator; temperature 293 K to 298 K; temperature measurements; Acoustic waves; Phonons; Resonant frequency; Scattering; Silicon; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems (MEMS), 2011 IEEE 24th International Conference on
  • Conference_Location
    Cancun
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4244-9632-7
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2011.5734452
  • Filename
    5734452