DocumentCode :
2767323
Title :
Design and optimisation of a MEMS-based tunable Fabry-Pérot infrared filter
Author :
Walmsley, Byron A. ; Dell, John M. ; Liu, Yinong ; Xiao Zhi Hu ; Bush, Mark B. ; Faraone, Lorenzo
Author_Institution :
Univ. of Western Australia, Crawley
fYear :
2006
fDate :
6-8 Dec. 2006
Firstpage :
272
Lastpage :
275
Abstract :
This study presents the theoretical design and analysis of a new surface micro-machined tuneable Fabry-Perot (FP) infrared filter for adaptive infrared photon detectors. The proposed structure uses broad spectral range, high reflectivity distributed Bragg reflector (DBR) mirrors based on amorphous Si/air layers, resulting in very high finesse filters. The device utilises three sacrificial layers to define the air-gap in the DBR mirrors, the resonant cavity spacer, and the separation of the top mirror from the supporting flexures. The flexures are fabricated from low-temperature plasma-enhanced chemical vapour deposited (PECVD) silicon nitride (SiNx) and Au thin films. Separation of the top mirror from the supporting flexures allows for improved fill-factors (up to 79%), as well as increased tuning range. Optical and finite element modelling of the device has shown large wavelength tuning ranges are achievable (1.5-2.5 mum) at low actuation voltages (<15 V), whilst still maintaining high cavity finesse.
Keywords :
Bragg gratings; infrared detectors; micromachining; micromechanical devices; mirrors; optical filters; plasma CVD; MEMS-based tunable Fabry-Perot infrared filter; PECVD; adaptive infrared photon detectors; distributed Bragg reflector mirrors; finite element modelling; low-temperature plasma-enhanced chemical vapour deposited; optical modelling; resonant cavity spacer; surface micromachined tuneable Fabry-Perot infrared filter; Adaptive filters; Amorphous materials; Design optimization; Distributed Bragg reflectors; Fabry-Perot; Infrared detectors; Mirrors; Optical surface waves; Optical tuning; Reflectivity; Amorphous Si; DBR mirrors; Fabry-Pérot; infrared filter; plasma CVD; thin films;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronic and Microelectronic Materials and Devices, 2006 Conference on
Conference_Location :
Perth, WA
Print_ISBN :
978-1-4244-0578-7
Electronic_ISBN :
978-1-4244-0578-7
Type :
conf
DOI :
10.1109/COMMAD.2006.4429934
Filename :
4429934
Link To Document :
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