DocumentCode :
2768260
Title :
Study of GaAsN thin film structures by X-ray reciprocal space mapping for multi-junction solar cell application
Author :
Suzuki, H. ; Kojima, N. ; Ohshita, Y. ; Yamaguchi, M.
Author_Institution :
Interdiscipl. Res. Organ., Univ. of Miyazaki, Miyazaki, Japan
fYear :
2010
fDate :
20-25 June 2010
Abstract :
Structural difference between high and low N induced scattering center (SCN) concentration GaAsN films grown on GaAs substrates has been investigated by X-ray reciprocal space mapping technique. Difference has been observed in diffuse scattering around GaAsN 004 and GaAs 004 Bragg peak, which is attributed to misfit dislocation at the interface of GaAsN/GaAs. With decreasing SCN, intensity of diffuse scattering increases. These results indicate that SCN prevent the generation and/or gliding of misfit dislocations.
Keywords :
arsenic compounds; gallium compounds; nitrogen compounds; solar cells; thin film devices; Bragg peak; GaAsN; X-ray reciprocal space mapping; diffuse scattering; induced scattering center; misfit dislocation; multijunction solar cell; thin film structure;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
Conference_Location :
Honolulu, HI
ISSN :
0160-8371
Print_ISBN :
978-1-4244-5890-5
Type :
conf
DOI :
10.1109/PVSC.2010.5616192
Filename :
5616192
Link To Document :
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