DocumentCode :
2768271
Title :
Breakdown walk-in: a new PMOS failure mode in high power BiCMOS applications
Author :
Brisbin, Douglas ; Strachan, Alejandro ; Chaparala, Prasad
Author_Institution :
National Semicond. Corp., Santa Clara, CA, USA
fYear :
2003
fDate :
20-23 Oct. 2003
Firstpage :
56
Lastpage :
60
Abstract :
Today\´s power management devices frequently require operation in the 50V to 100V range based on F. de Pestel et al., (2003). These circuits implements a BiCMOS process that combine low to medium voltage (5-15V) with high voltage devices. In these applications the high voltage PMOS must be able to operate at high currents, voltage (e.g. 80V) and temperatures (150°C) while sustaining a drain breakdown voltage well in excess of the device operating voltage. Because of the high voltages, currents and temperatures seen by these devices the long term reliability is a key concern. This paper focuses on an HV-PMOs device failure mode identified during high temperature operational life testing that resulted in functional quiescent current failure. This paper differs from previous work in that it presents data on a new PMOS failure mechanism "breakdown voltage walk-in" not yet discussed in the literature.
Keywords :
BiCMOS integrated circuits; MOS integrated circuits; failure analysis; high-voltage techniques; power integrated circuits; semiconductor device reliability; 150 C; 5 to 15 V; 50 to 100 V; BiCMOS process; PMOS failure mode; PMOS reliability; breakdown voltage walk-in; drain breakdown voltage; functional quiescent current failure; high currents; high power BiCMOS; high voltage PMOS; high voltage devices; power management devices; BiCMOS integrated circuits; Breakdown voltage; Displays; Electric breakdown; Energy management; Implants; Life testing; MOS devices; Stress; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report, 2003 IEEE International
Print_ISBN :
0-7803-8157-2
Type :
conf
DOI :
10.1109/IRWS.2003.1283301
Filename :
1283301
Link To Document :
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