Native-conflict-avoiding track routing for double patterning technology

Double patterning lithography is extensively used to increase the half-pitch resolution. If there is no enough space to insert a stitch for the un-decomposable pattern, a native conflict is generated. A layout with native conflicts will result in layout modification. The current researches focus on reducing the numbers of stitches and native conflicts in the post-layout or detailed routing stages. In this paper, we propose a track routing algorithm to avoid native conflicts and predict the traces of detailed routing. Experimental results show that the proposed method not only minimizes the number of native conflicts significantly, but also reduces wirelength.