• DocumentCode
    2770675
  • Title

    Architecture approaching the atomic scale

  • Author

    DeHon, André

  • Author_Institution
    Univ. of Pennsylvania, Philadelphia
  • fYear
    2007
  • fDate
    11-13 Sept. 2007
  • Firstpage
    11
  • Lastpage
    20
  • Abstract
    Both bottom-up and top-down techniques have been used to fabricate assemblies of devices and interconnect where key, density-defining feature sizes are on the order of ten atoms wide. We show how complete computing architectures can be constructed from these new techniques and building blocks despite high defect rates, extreme regularity requirements, and statistical assembly. We further highlight the paradigm shifts in integrated circuit design and architecture which appear necessary to accommodate these atomic-scale effects. Our estimates suggest a 10 nm full-pitch FPGA-like design can achieve one to two orders of magnitude greater logic density than ideal, defect-free lithographic scaling to 22 nm.
  • Keywords
    atomic structure; integrated circuit design; statistical analysis; FPGA-like design; architecture approaching; atomic scale; integrated circuit architecture; integrated circuit design; statistical assembly; Assembly; Atomic layer deposition; Atomic measurements; Computer architecture; Conducting materials; Dielectrics and electrical insulation; Nanowires; Semiconductivity; Semiconductor materials; Wires;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Circuits Conference, 2007. ESSCIRC 2007. 33rd European
  • Conference_Location
    Munich
  • ISSN
    1930-8833
  • Print_ISBN
    978-1-4244-1125-2
  • Type

    conf

  • DOI
    10.1109/ESSCIRC.2007.4430241
  • Filename
    4430241