DocumentCode
2770675
Title
Architecture approaching the atomic scale
Author
DeHon, André
Author_Institution
Univ. of Pennsylvania, Philadelphia
fYear
2007
fDate
11-13 Sept. 2007
Firstpage
11
Lastpage
20
Abstract
Both bottom-up and top-down techniques have been used to fabricate assemblies of devices and interconnect where key, density-defining feature sizes are on the order of ten atoms wide. We show how complete computing architectures can be constructed from these new techniques and building blocks despite high defect rates, extreme regularity requirements, and statistical assembly. We further highlight the paradigm shifts in integrated circuit design and architecture which appear necessary to accommodate these atomic-scale effects. Our estimates suggest a 10 nm full-pitch FPGA-like design can achieve one to two orders of magnitude greater logic density than ideal, defect-free lithographic scaling to 22 nm.
Keywords
atomic structure; integrated circuit design; statistical analysis; FPGA-like design; architecture approaching; atomic scale; integrated circuit architecture; integrated circuit design; statistical assembly; Assembly; Atomic layer deposition; Atomic measurements; Computer architecture; Conducting materials; Dielectrics and electrical insulation; Nanowires; Semiconductivity; Semiconductor materials; Wires;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Circuits Conference, 2007. ESSCIRC 2007. 33rd European
Conference_Location
Munich
ISSN
1930-8833
Print_ISBN
978-1-4244-1125-2
Type
conf
DOI
10.1109/ESSCIRC.2007.4430241
Filename
4430241
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