DocumentCode :
2771352
Title :
Wafer-level mechanical and electrical integration of SMA wires to silicon MEMS using electroplating
Author :
Clausi, Donato ; Gradin, Henrik ; Braun, Stefan ; Peirs, Jan ; Reynaerts, Dominiek ; Stemme, Göran ; Van Der Wijngaart, Wouter
Author_Institution :
KUL-Katholieke Univ. Leuven, Leuven, Belgium
fYear :
2011
fDate :
23-27 Jan. 2011
Firstpage :
1281
Lastpage :
1284
Abstract :
This paper reports on the wafer-level fixation and electrical connection of pre-strained SMA wires on silicon MEMS using electroplating, providing high bond strength and electrical connections in one processing step. The integration method is based on standard micromachining techniques, and it potentially allows mass production of microactuators having high work density. SEM observation showed an intimate interconnection between the SMA wire and the silicon substrate, and destructive testing performed with a shear tester showed a bond strength exceeding 1 N. The first Joule-heated SMA wire actuators on silicon were fabricated and their performance evaluated. Measurements on a 4.5 x 1.8 mm2 footprint device show a 460 μm stroke at low power consumption (70 mW).
Keywords :
alloys; electroplating; low-power electronics; microactuators; shape memory effects; wires; Joule-heated SMA wire actuator; SEM observation; bond strength; destructive testing; electrical connection; electroplating; high work density; low power consumption; mass production; microactuator; power 70 mW; prestrained SMA wire; shear tester; silicon MEMS; silicon substrate; standard micromachining; wafer-level fixation; Actuators; Micromechanical devices; Nickel; Resists; Silicon; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems (MEMS), 2011 IEEE 24th International Conference on
Conference_Location :
Cancun
ISSN :
1084-6999
Print_ISBN :
978-1-4244-9632-7
Type :
conf
DOI :
10.1109/MEMSYS.2011.5734667
Filename :
5734667
Link To Document :
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