• DocumentCode
    2771610
  • Title

    A trench-type anti-wear microprobe with nano-scale electric contacts for AFM LAO lithography

  • Author

    Li, Y.F. ; Tomizawa, Y. ; Koga, A. ; Hashiguchi, G. ; Sugiyama, M. ; Fujita, H.

  • Author_Institution
    BEANS Lab., Tokyo, Japan
  • fYear
    2011
  • fDate
    23-27 Jan. 2011
  • Firstpage
    1337
  • Lastpage
    1340
  • Abstract
    A novel trench-type anti-wear microprobe with nano-scale electric contacts was proposed as an AFM probe to overcome the problem of probe tip wear and improve patterning stability in Atomic force microscope (AFM) local anodic oxidation (LAO) lithography. The proposed microprobe was fabricated using MEMS technique. The patterning and wear properties of the fabricated microprobe in AFM LAO lithography were investigated in terms of the change in the drawn line width and probe tip shape before and after a 20 mm scan. SEM images of the probe tips before and after the scan indicated that there was no obvious damage in the fabricated probe tip while apparent damage could be found on the conventional type probe tip. AFM LAO lithography results showed that the fabricated microprobe maintained a stable pattering performance before and after the 20 mm scan while the conventional type probe was unable to draw due to tip wear after the scan.
  • Keywords
    atomic force microscopy; electrical contacts; lithography; scanning electron microscopy; atomic force microscopy; local anodic oxidation lithography; nanoscale electric contacts; trench-type anti-wear microprobe; Electrodes; Force; Lithography; Probes; Scanning electron microscopy; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems (MEMS), 2011 IEEE 24th International Conference on
  • Conference_Location
    Cancun
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4244-9632-7
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2011.5734681
  • Filename
    5734681