DocumentCode :
2771833
Title :
A sensor platform based on piezoresistive cantilever
Author :
Xiaomei, Yu ; Dacheng, Zhang ; Wei, Wang ; Ting, Li
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
fYear :
2003
fDate :
16-18 Dec. 2003
Firstpage :
121
Lastpage :
124
Abstract :
In this paper U-shaped as well as rectangular piezoresistive cantilever array have been designed and fabricated based on silicon micromachining technology. Single crystalline silicon is used as the piezoresistive material. The sensitivities and the noises of piezoresistive cantilevers were systematically investigated from both the theory and the experimental results. The minimum detectable deflections (MDD) of piezoresistive cantilever are calculated to be 0.3 nm for rectangular cantilever and 0.2 nm for U-shaped cantilever at a 6 V bias voltage and a 1000 Hz measurement bandwidth. Using polymer-coated cantilevers as a chemical sensor, its response to water vapor was tested by measuring its output voltage signals. The measurement shows that the sensor sensitivity is high and the response is quick.
Keywords :
chemical sensors; electric noise measurement; elemental semiconductors; micromachining; micromechanical devices; piezoelectric semiconductors; piezoresistive devices; polymer films; resistors; silicon; silicon-on-insulator; 0.2 nm; 0.3 nm; 1000 Hz; 6 V; Si; U-shaped cantilever; chemical sensor; minimum detectable deflections; piezoresistive material; polymer-coated cantilevers; rectangular piezoresistive cantilever array; sensor platform; sensor sensitivity; silicon micromachining technology; water vapor testing; Bandwidth; Chemical sensors; Crystalline materials; Crystallization; Micromachining; Piezoresistance; Polymers; Silicon; Testing; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits, 2003 IEEE Conference on
Print_ISBN :
0-7803-7749-4
Type :
conf
DOI :
10.1109/EDSSC.2003.1283497
Filename :
1283497
Link To Document :
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