Research on the mask micro-transparent defect repair assisted with UV laser

Photo-mask is a pivotal tool in photolithography process. The quality of the photo-mask has much effect on the figures of integrate circuit. With the fast development of the micro-electronics technology and laser application technology, in some advanced countries, the research on the photo-mask defect repair technology, especially on the clear defect laser repair technology has been strengthened. This paper focuses on this application. By use of the 355nm UV laser the chromium powder between two piece of ultra-white glass has been affected to coat thin film on the glass under normal conditions. We analyze the parameters of the Cr film by experiential methods and also the morphology, thickness, surface smoothness, components of the experiential results. The result is that Cr film with uniform thickness, good adhesion and stable components can be obtained in specific laser parameters. Finally the conclusion is that this method can be used to repair the clear defect on the Cr-mask.