DocumentCode
2775851
Title
Ultraclean Technology for ULSI Scientific Manufacturing
Author
Ohmi, Tadahiro
Author_Institution
Tohoku University
fYear
1993
fDate
20-21 Sept. 1993
Keywords
Annealing; CMOS technology; Copper; Epitaxial growth; Manufacturing; Oxidation; Silicon; Surface resistance; Temperature; Ultra large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 1993. International Symposium on
Conference_Location
Austin, TX, USA
Type
conf
DOI
10.1109/ISSM.1993.670308
Filename
670308
Link To Document