DocumentCode :
2775851
Title :
Ultraclean Technology for ULSI Scientific Manufacturing
Author :
Ohmi, Tadahiro
Author_Institution :
Tohoku University
fYear :
1993
fDate :
20-21 Sept. 1993
Keywords :
Annealing; CMOS technology; Copper; Epitaxial growth; Manufacturing; Oxidation; Silicon; Surface resistance; Temperature; Ultra large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 1993. International Symposium on
Conference_Location :
Austin, TX, USA
Type :
conf
DOI :
10.1109/ISSM.1993.670308
Filename :
670308
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2775851
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