• DocumentCode
    2776083
  • Title

    Ultraclean Technologies: Light Point Defects, Surface Roughness And Metal Contamination

  • Author

    Heyns, M.M. ; Mertens, P.W. ; Meuris, M. ; Verhaverbeke, S. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Graf, D.

  • Author_Institution
    IMEC
  • fYear
    1993
  • fDate
    20-21 Sept. 1993
  • Keywords
    Atomic measurements; Chemicals; Force measurement; Light scattering; Pollution measurement; Rough surfaces; Scanning electron microscopy; Silicon; Surface contamination; Surface roughness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 1993. International Symposium on
  • Conference_Location
    Austin, TX, USA
  • Type

    conf

  • DOI
    10.1109/ISSM.1993.670309
  • Filename
    670309