DocumentCode
2776083
Title
Ultraclean Technologies: Light Point Defects, Surface Roughness And Metal Contamination
Author
Heyns, M.M. ; Mertens, P.W. ; Meuris, M. ; Verhaverbeke, S. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Graf, D.
Author_Institution
IMEC
fYear
1993
fDate
20-21 Sept. 1993
Keywords
Atomic measurements; Chemicals; Force measurement; Light scattering; Pollution measurement; Rough surfaces; Scanning electron microscopy; Silicon; Surface contamination; Surface roughness;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 1993. International Symposium on
Conference_Location
Austin, TX, USA
Type
conf
DOI
10.1109/ISSM.1993.670309
Filename
670309
Link To Document