DocumentCode :
2776083
Title :
Ultraclean Technologies: Light Point Defects, Surface Roughness And Metal Contamination
Author :
Heyns, M.M. ; Mertens, P.W. ; Meuris, M. ; Verhaverbeke, S. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Graf, D.
Author_Institution :
IMEC
fYear :
1993
fDate :
20-21 Sept. 1993
Keywords :
Atomic measurements; Chemicals; Force measurement; Light scattering; Pollution measurement; Rough surfaces; Scanning electron microscopy; Silicon; Surface contamination; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 1993. International Symposium on
Conference_Location :
Austin, TX, USA
Type :
conf
DOI :
10.1109/ISSM.1993.670309
Filename :
670309
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2776083
