DocumentCode :
2776561
Title :
Ultraclean Technology: Gas Delivery Issues In The Submicron Realm
Author :
Kobayashi, Hisayoshi
Author_Institution :
Ultra Clean Technology Systems and Service, Inc.
fYear :
1993
fDate :
20-21 Sept. 1993
Keywords :
Degradation; Fabrication; Gases; Geometry; Impurities; Maintenance; Manufacturing; Moisture; Semiconductor device manufacture; Surface contamination;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 1993. International Symposium on
Conference_Location :
Austin, TX, USA
Type :
conf
DOI :
10.1109/ISSM.1993.670311
Filename :
670311
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2776561
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